H. Liu, B. Richards, A. Zakhor, and B. Nikolic. “Hardware Implementation of Block GC3 Lossless Compression Algorithm for Direct-Write Lithography Systems,” submitted to SPIE Conference in Advanced Lithography, February 2010. [Adobe PDF]
G. Cramer, H. Liu, and A. Zakhor. “Lossless Compression Algorithm for REBL Direct-Write E-Beam Lithography System,” submitted to SPIE Conference in Advanced Lithography, February 2010. [Adobe PDF]
R. Miyakawa, P. Naulleau, and A. Zakhor. “Iterative Procedure for In-situ EUV Optical Testing with an Incoherent Source.” International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN) 2009, Marco Island, Florida, June 2009. [Adobe PDF]
A. Zakhor, V. Dai, and G. Cramer. “Full Chip Characterization of Compression Algorithms for Direct Write Maskless Lithography Systems,” SPIE Conference on Advanced Lithography, San Jose, California, February 2009. (invited paper) [Adobe PDF]
A. Gu and A. Zakhor, "Lossless Compression Algorithms for Hierarchical IC Layout," accepted for publication in IEEE Transactions on Semiconductor Manufacturing, Volume 21, No. 2, pp 285-296, May 2008. [Adobe PDF]
A. Gu and A. Zakhor, "Optical Proximity Correction with Linear Regression," IEEE Transactions on Semiconductor Manufacturing, Volume 21, Number 2, pp 263 - 271, May 2008. (2008 Best Paper Award) [Adobe PDF]
P. Gao, A. Gu, and A. Zakhor, "Optical Proximity Correction with Principal Component Regression," Optical Microlithography XXI, Proceeding of SPIE, San Jose, California, Vol. 6924, February 2008. [Adobe PDF]
A. Gu and A. Zakhor, "Lossless Compression Algorithms for Post-OPC IC Layout", To appear in Proc. ICIP 2007, September 16-19, 2007, San Antonio, Texas. [Adobe PDF]
A. Gu and A. Zakhor, "Lossless Compression Algorithm for Hierarchical IC Layout Data", Proceedings of SPIE, Vol. 6520, Optical Lithography XX, pp. 652017-1 to 652017-17, Feb. 2007. [Adobe PDF]
H. Liu, V. Dai, A. Zakhor and B. Nikolic, "Reduced Complexity Compression Algorithms for Direct-Write Maskless Lithography Systems," SPIE Journal of Microlithography, MEMS, and MOEMS (JM3), Vol. 6, 013007, Feb. 2, 2007. [Adobe PDF]
V. Dai and A. Zakhor, "Lossless Compression of VLSI Layout Image Data," IEEE Trans. on Image Processing, Vol. 15, Issue 9, Sept. 2006 , pp. 2522-2530 [Adobe PDF]
H. Liu, V. Dai, A. Zakhor and B. Nikolic, "Reduced Complexity Compression Algorithms for Direct-Write Maskless Lithography Systems", Emerging Lithographic Technologies X, Proceedings of SPIE, San Jose, California, Vol. 6151, 61512B-12, March 2006. [Adobe PDF]
V. Dai and A. Zakhor, "Complexity
Reduction for C4 Compression for Implementation in Maskless Lithography
Datapath", in Emerging Lithographic Technologies IX, Proceedings of
the SPIE,
V. Dai and A. Zakhor, "Advanced Low-complexity Compression for Maskless Lithography Data" in Emerging Lithographic Technologies VIII, Proceedings of the SPIE, San Jose, California, Vol. 5374, No. 1, February 2004, pp. 610-618. [Adobe PDF]
V. Dai and A. Zakhor, "Lossless Compression Techniques for Maskless Lithography Data" in Emerging Lithographic Technologies VI, Proceedings of the SPIE, San Jose, California, March 2002, Vol. 4688, p. 583-594. [Adobe PDF]
V. Dai and A. Zakhor, ``Lossless Layout Compression for Maskless Lithography Systems'' in Emerging Lithographic Technologies IV, Proceedings of the SPIE, San Jose, California, March 2000, Vol. 3997, pp. 467-477. [Postscript] [Adobe PDF]
N. Cobb, A. Zakhor, M. Reihani, F. Jahansooz, and V. Raghavan, ``Experimental Results on Optical Proximity Correction with Variable Threshold Resist Model,'' in SPIE Symposium on Optical Microlithography, Santa Clara, California, March 1997, vol. 3051, pp. 458-468.
N. Cobb, A. Zakhor, and E. Miloslavsky, ``Mathematical and CAD Framework for Proximity Correction,'' in Proceedings of SPIE Symposium on Optical Microlithography, Santa Clara, CA, March 1996, vol. 2726, pp. 208-222.
N. Cobb and A. Zakhor, ``Fast Sparse Aerial Image Calculation for OPC,'' in Proceedings of BACUS Symposium on Photomask Technology, Santa Clara, California, September 1995, vol. 2621, pp. 534-545. [Postscript]
N. Cobb and A. Zakhor, ``Fast, Low-Complexity Mask Design,'' in Proceedings of the SPIE Symposium on Optical Microlithography, Santa Clara, California, February 1995, vol. 2440, pp. 313-327. [Postscript]